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FF835-SDi01-t3-25×36
835 nm BrightLine® multiphoton 3P short-pass super-resolution / TIRF dichroic beamsplitter
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Description
Dispo
Prix
FF835-SDi01-t3-25×36
835 nm BrightLine® multiphoton 3P short-pass super-resolution / TIRF dichroic beamsplitter
12 à 14 semaines*
1 280,00€
*sujet à variation en fonction des stocks disponibles.
Courbe de réponse
FF835-SDi01-t3-25×36
Innovative short pass dichroic beamsplitter optimized for 3-photon laser excitation in a standard epi-fluorescence microscope configuration with reflected excitation and transmitted emission.
The 2-photon (Red) and 3-photon (Green & Red) excitation regions are ideal for femtosecond pulsed lasers such as Ti:Sapphire, OPO or OPA coupled, and neodymium- and ytterbium-doped lasers, enabling deep tissue imaging with improved contrast. This multiphoton dichroic has low reflected GDD that helps minimize temporal pulse broadening of reflected 1300 nm and 1700 nm laser pulses, and very high and flat reflection and transmission bands.
Semrock’s Super-resolution / TIRF dichroics are available in two thicknesses and deliver industry-leading flatness for minimal focus shift and optical wavefront aberrations of the laser beam spot to enable popular imaging and super-resolution techniques such as TIRF, PALM, STORM, structured illumination, STED, and multiphoton imaging.
2.5λ P-V RWE on 1 mm, optimized for reflecting laser beams up to 6 mm in diameter while minimizing RWE
λ/3 P-V RWE on 3 mm, optimized for reflecting laser beams up to 16.7 mm in diameter while minimizing RWE
size
25.2 mm x 35.6 mm x 3.0 mm
shape
rectangular
mounted
false
substrate.type
low-autofluorescence optical quality glass
scratch-dig
60-40
tavg-and-passband-range.1
Tavg > 90% 400 – 820 nm
tavg-and-passband-range.2
Tavg > 80% 400 – 420 nm (Rolling Window: 10 nm)
tavg-and-passband-range.3
Tavg > 90% 420 – 820 nm (Rolling Window: 10 nm)
edgewl.1
835 nm
ravg-and-passband-range.1
Ravg > 94% 1200 – 1350 nm
ravg-and-passband-range.1(p-pol)
Ravg > 90% 1200 – 1350 nm
ravg-and-passband-range.1(s-pol)
Ravg > 98% 1200 – 1350 nm
ravg-and-passband-range.2
Ravg > 94% 1600 – 1870 nm
ravg-and-passband-range.2(p-pol)
Ravg > 90% 1600 – 1870 nm
ravg-and-passband-range.2(s-pol)
Ravg > 98% 1600 – 1870 nm
laserwls.1
1200 - 1350 nm
laserwls.2
1600 - 1870 nm
aoi
45 ± 1.5 degrees
cha
2 degrees
Optical.Damage.Rating
1 J/cm² @ 532 nm (10 ns pulse width)
Effective.Index
GDD
± 1500 fs² over 1200 - 1350 nm reflection band for S-Pol and P-Pol
GDD.2
± 750 fs² over 1600 - 1870 nm reflection band for S-Pol and P-Pol
Flatness.RWE
RWE.1
< 2.5λ P-V RWE @ 632.8 nm
RWE.3
< 0.33λ P-V RWE @ 632.8 nm
MaxBeamDia.1
6 mm
MaxBeamDia.3
16.7 mm
Transverse.Dimensions.(LxW)
25.2 mm x 35.6 mm
Transverse.Tolerance.(mounted)
± 0.1 mm
Filter.Thickness.1.(unmounted)
1.05 mm
Filter.Thickness.Tolerance.1.(unmounted)
± 0.05 mm
Filter.Thickness.3.(unmounted)
3.0 mm
Filter.Thickness.Tolerance.3.(unmounted)
± 0.1 mm
Clear.Aperture
≥ 80% (elliptical)
Substrate.Type
Fused Silica
Substrate Thickness (1 mm, unmounted)
1.05 mm
Substrate Thickness Tolerance (1 mm, unmounted)
± 0.05 mm
Substrate Thickness (3 mm, unmounted)
3.0 mm
Substrate Thickness Tolerance (3 mm, unmounted)
± 0.1 mm
Orientation
Reflective surface marked with laser dot - Orient in direction of incoming light